9780070418530-0070418535-Process Engineering: Analysis in Semiconductor Device Fabrication

Process Engineering: Analysis in Semiconductor Device Fabrication

ISBN-13: 9780070418530
ISBN-10: 0070418535
Edition: First Edition
Author: Stanley Middleman, Arthur Hochberg
Publication date: 1993
Publisher: McGraw-Hill College
Format: Hardcover 672 pages
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Book details

ISBN-13: 9780070418530
ISBN-10: 0070418535
Edition: First Edition
Author: Stanley Middleman, Arthur Hochberg
Publication date: 1993
Publisher: McGraw-Hill College
Format: Hardcover 672 pages

Summary

Process Engineering: Analysis in Semiconductor Device Fabrication (ISBN-13: 9780070418530 and ISBN-10: 0070418535), written by authors Stanley Middleman, Arthur Hochberg, was published by McGraw-Hill College in 1993. With an overall rating of 3.8 stars, it's a notable title among other Chemical (Engineering) books. You can easily purchase or rent Process Engineering: Analysis in Semiconductor Device Fabrication (Hardcover) from BooksRun, along with many other new and used Chemical books and textbooks. And, if you're looking to sell your copy, our current buyback offer is $0.3.

Description

Anyone involved in the field of chemical engineering or responsible for process design, maintenance, and analysis will appreciate Process Engineering Analysis in Semiconductor Device Fabrication - the only current book that offers comprehensive coverage of the growing interest in process improvement. Now, more than ever, it is evident that process improvement will enhance attempts to improve economic efficiency in the semiconductor device industries.
Much of the book includes recent material presented with a degree of integration and criticism not available in the original journal publications. Worked examples illustrate how one uses fundamental principles to model processes. Where possible, models are compared with experimental data, and the success and/or failure of a model is presented as a learning experience. In addition, an extensive set of problems offers an opportunity for the reader to be guided into directions beyond the scope of the book itself.
The two authors' vast combined experience in the fields of chemical engineering, process engineering, electrical engineering, and physics offers readers expert insight into as well as broad exposure to new areas of technology.

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